專利名稱：Method for fabricating photoanode for dye-sensitized solar cell（美國發明專利第8,956,910號）
專利授權與讓售 |
年度(國民年)(Year)：104 |
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核准國家(Country)：US |
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專利名稱(Title)：Method for fabricating photoanode for dye-sensitized solar cell |
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證書號碼(Number)：8,956,910 |
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專利類型(Type)：Invention |
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專利期間(Term)：2012-05-31~2033-06-14 |
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摘要 (Abstract) |
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| Disclosed herein is a method for fabricating a photoanode used in a dye-sensitized solar cell (DSSC). The method includes the following steps. Particle colloid is electrospun to form a first electrospun thin film layer on a substrate. The particle colloid includes titanium dioxide nanoparticles, polymer, a dispersing agent and solvent. The first electrospun thin film layer is then sintered to form a main titanium dioxide layer. A photoanode manufactured by the method mentioned above is also prov | |
